Iris Publishers - Modern Concepts in Material Science (MCMS)
Effect of Infrared Radiation on the
Hydrogen in Thin Films Double Barriers Based Melt Silicone-Germany
Authorized
by Abasov FP
Possibilities
of plasma chemical deposition of α-Si1-x Gex:H (x=0÷1) films undoped and doped
with PH3 or B2H6 have been analyzed from the viewpoint of their application in
p-i-n structures of solar cell. The optical properties are considered, and the
amount of hydrogen contained in those films is determined. The film properties
are found to strongly depend on the film composition and the hydrogenation
level. The number of hydrogen atoms in the films is varied by changing the gas
mixture composition, and IR absorption in α-Si: H and α-Ge:H films is measured.
The α-Si:H and а-Si0,88Ge1,2:H films were used to fabricate three-layer solar
with an element area of 1,3 sm2 and an efficiency (η) of 9.5 %.

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